The Impact of Tax Incentives on R&D Investment of Integrated Circuit Enterprises
- DOI
- 10.2991/978-2-38476-323-8_82How to use a DOI?
- Keywords
- R&D investment; tax incentives; Tax incentives
- Abstract
This paper explores the impact of tax incentives on R&D investment by IC firms. As a technology-intensive and talent-intensive industry, the integrated circuit industry is a key industry to promote national economic development. In order to enhance the independent research and development capabilities of China's integrated circuit industry and reduce its dependence on foreign countries, the Chinese government has successively introduced a series of support policies since 2014. Based on an empirical analysis of the panel data of 116 A-share listed IC companies from 2015 to 2022, this paper finds that tax incentives significantly promote R&D investment. Especially in the economically developed eastern region, the effect of tax incentives is even more obvious. This paper proposes to further expand the scope of tax incentives, pay attention to talent training and incentives, and strengthen local government incentives to promote the development of the integrated circuit industry.
- Copyright
- © 2024 The Author(s)
- Open Access
- Open Access This chapter is licensed under the terms of the Creative Commons Attribution-NonCommercial 4.0 International License (http://creativecommons.org/licenses/by-nc/4.0/), which permits any noncommercial use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license and indicate if changes were made.
Cite this article
TY - CONF AU - Wensi Jiang PY - 2024 DA - 2024/12/23 TI - The Impact of Tax Incentives on R&D Investment of Integrated Circuit Enterprises BT - Proceedings of the 2024 7th International Conference on Humanities Education and Social Sciences (ICHESS 2024) PB - Atlantis Press SP - 719 EP - 725 SN - 2352-5398 UR - https://doi.org/10.2991/978-2-38476-323-8_82 DO - 10.2991/978-2-38476-323-8_82 ID - Jiang2024 ER -